WebKafai Lai, IBM Microelectronics Div. (United States) Gregg M. Gallatin, IBM Microelectronics Div. (United States) Mark A. van de Kerkhof, ASML (Netherlands) Wim de Boeij, ASML … WebKOK; Haico Victor › Patent 15/486077 Inventors uspto.report › patents › VOOGD; Robbert Jan › Patent 15/486077 Inventors Patent Application Summary U.S. patent application …
Koen Kivits Inventions, Patents and Patent Applications - Justia ...
WebMay 22, 2013 · M. A. van de Kerkhof, W. D. de Boeij, Haico Kok, M. Silova, J. Baselmans, M. Hemerik; Physics. SPIE Advanced Lithography. 2004; Advanced optical systems for low k1 lithography require accurate characterisation of various imaging parameters to insure that OPC strategies can be maintained. Among these parameters lens … WebApr 12, 2013 · Wim P. de Boeij, Remi Pieternella, Igor Bouchoms, Martijn Leenders, Marjan Hoofman, Roelof de Graaf, Haico Kok, Par Broman, Joost Smits, Jan-Jaap Kuit, and … free adware
Full optical column characterization of DUV lithographic projection ...
WebMay 1, 2004 · Haico Kok Marianna Silova Abstract Advanced optical systems for low k1 lithography require accurate characterisation of various imaging parameters to insure that OPC strategies can be maintained.... WebHaico Kok, ASML Netherlands B.V. (Netherlands) Par Broman, ASML Netherlands B.V. (Netherlands) Joost Smits, ASML Netherlands B.V. (Netherlands) Jan-Jaap Kuit, ASML … WebSep 20, 2024 · Wavefront aberration measurement for a high NA objective lens with high accuracy and low cost is achievable through this method, and the feasibility of the proposed method is verified experimentally. Wavefront aberration is one important parameter for objective lenses. When the NA (Numerical Aperture) of the objective lens becomes … blister pack recycling melbourne